Tantalum Electrode   Ta Electrodes

We supply tantalum electrodes which are mainly used in chemical vapor deposition (CVD) ,semiconductor and physical vapor deposition (PVD) processes including thermal and electron beam (E-Beam) evaporation,atomic layer deposition (ALD), low temperature organic evaporation, metallic-organic and chemical vapor deposition (MOCVD).
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  • Specifications of Tantalum Electrode ( Ta Electrodes )
    * Standard: ASTM B521, ASTM B365, ASTM B708,
    * Purity: 99.95% 
    * Density: ≥16.6g/cm3;
    * Melting point:2996˚ C
    * Color: silver
    * Size:Bolts: M2-M64*L6-300mm
              or per customer's requirements  / drawing
    Ta electrode

    * Features of Tantalum Electrode ( Ta Electrodes ):
    1. Light weight
    2. High corrosion resistance
    3  Heat resistant
    4. low density
    5. Good thermal stability
    tantalum electrodes


    Applications of Tantalum Electrode ( Ta Electrodes )
    1.Chemical vapor deposition (CVD)
    2.Semiconductor and Physical vapor deposition (PVD)
    3.Thermal and electron beam (E-Beam) evaporation
    4.Atomic layer deposition (ALD)
    5.Low temperature organic evaporation
    6.Metallic-organic and chemical vapor deposition (MOCVD)
       etc.

    If you are interested in our tantalum products , please submit the webform below with the sizes . We will quote the latest price to you within one business day . Customization and bulk orders are our specialty.
  • Detailed informations :
    Spceial requirements if you need , please feel free to send us Email: shanghaimaterials@126.com .
    or submit the inquiry form in bottom  of this page.

    Physical Properties of Tantalum Electrode ( Ta Electrodes ):
    Density 16.6 g/cc
    Coefficient of Thermal Expansion (20°C) 6.5 x 10(-6) / °C
    Electrical Resistivity (20°C) 13.5 microhms-cm
    Melting Point 3290 K, 2996°C, 5462°F
    Boiling Point 5731 K, 6100°C, 9856°F
    Electrical Conductivity 13% IACS
    Specific Heat .036 cal/g/°C
    Thermal Conductivity .13 cal/cm(2)/cm°C/sec

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